Principles of Plasma Discharges and Materials Processing

By:

Lieberman, M. A . (Michael A.)

Contributor(s):

Lichtenberg, Allan J

Material type: Text

TextPublication details: New York : : Wiley, , c1994.Description: xxvi, 572 p. : : ill. ; ; 25 cmISBN:

9780471005773

Subject(s):

DDC classification:

530.4/4 LIE 1994

Summary: Authored by two internationally respected pioneers in the field, this book offers a fully integrated, pedagogically consistent presentation of the fundamental physics and chemistry of partially ionized, chemically reactive, low-pressure plasmas and their roles in a wide range of plasma discharges and processes used in thin film processing applications - especially in the fabrication of integrated circuits. With many fully worked examples, practice exercises, and clear demonstrations of the relationship of plasma parameters to external control parameters and processing results, this book combines the best qualities of a student text and a professional resource.

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Holdings ( 1 )
Title notes ( 3 )

Holdings
Item type	Current library	Home library	Collection	Shelving location	Call number	Status	Date due	Barcode	Item holds
Open Collection	FIRST CITY UNIVERSITY COLLEGE	FIRST CITY UNIVERSITY COLLEGE	Open Collection	FCUC Library	530.44 LIE 1994 (Browse shelf(Opens below))	Available		00005035

Total holds: 0

"A Wiley-Interscience publication.".

Includes bibliographical references (p. 559-564) and index.

Authored by two internationally respected pioneers in the field, this book offers a fully integrated, pedagogically consistent presentation of the fundamental physics and chemistry of partially ionized, chemically reactive, low-pressure plasmas and their roles in a wide range of plasma discharges and processes used in thin film processing applications - especially in the fabrication of integrated circuits. With many fully worked examples, practice exercises, and clear demonstrations of the relationship of plasma parameters to external control parameters and processing results, this book combines the best qualities of a student text and a professional resource.