Principles of Plasma Discharges and Materials Processing
Lieberman, M. A
Principles of Plasma Discharges and Materials Processing - New York : : Wiley, , c1994. - xxvi, 572 p. : : ill. ; ; 25 cm.
"A Wiley-Interscience publication.".
Includes bibliographical references (p. 559-564) and index.
Authored by two internationally respected pioneers in the field, this book offers a fully integrated, pedagogically consistent presentation of the fundamental physics and chemistry of partially ionized, chemically reactive, low-pressure plasmas and their roles in a wide range of plasma discharges and processes used in thin film processing applications - especially in the fabrication of integrated circuits. With many fully worked examples, practice exercises, and clear demonstrations of the relationship of plasma parameters to external control parameters and processing results, this book combines the best qualities of a student text and a professional resource.
9780471005773
Plasma dynamics.
Thin films--Surfaces.
Plasma etching.
Plasma chemistry.
530.4/4 LIE 1994
Principles of Plasma Discharges and Materials Processing - New York : : Wiley, , c1994. - xxvi, 572 p. : : ill. ; ; 25 cm.
"A Wiley-Interscience publication.".
Includes bibliographical references (p. 559-564) and index.
Authored by two internationally respected pioneers in the field, this book offers a fully integrated, pedagogically consistent presentation of the fundamental physics and chemistry of partially ionized, chemically reactive, low-pressure plasmas and their roles in a wide range of plasma discharges and processes used in thin film processing applications - especially in the fabrication of integrated circuits. With many fully worked examples, practice exercises, and clear demonstrations of the relationship of plasma parameters to external control parameters and processing results, this book combines the best qualities of a student text and a professional resource.
9780471005773
Plasma dynamics.
Thin films--Surfaces.
Plasma etching.
Plasma chemistry.
530.4/4 LIE 1994