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IC Mask Design: Essential Layout Techniques.
Material type:
TextSeries: McGraw-Hill professional engineeringPublication details: New York : Mcgraw-Hill, c2002.Description: xviii, 457 p. : ill. (some col.) ; 24 cmISBN: - 9780071389969
- 621.3815 SAI 2002
- TK7874.55 .S3538 2002
| Item type | Current library | Home library | Collection | Shelving location | Call number | Status | Date due | Barcode | Item holds |
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Open Collection
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FIRST CITY UNIVERSITY COLLEGE | FIRST CITY UNIVERSITY COLLEGE | Open Collection | FCUC Library | 621.3815 SAI 2002 (Browse shelf(Opens below)) | Available | 00016580 | ||
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Open Collection
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FIRST CITY UNIVERSITY COLLEGE | FIRST CITY UNIVERSITY COLLEGE | Open Collection | FCUC Library | 621.3815 SAI 2002 (Browse shelf(Opens below)) | Available | 00014172 |
Total holds: 0
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| 621.3815 ROH Microwave and wireless synthesizers : | 621.3815 ROH Microwave and wireless synthesizers : | 621.3815 RYD Electronic Engineering Principles | 621.3815 SAI 2002 IC Mask Design: Essential Layout Techniques. | 621.3815 SAI 2002 IC Mask Design: Essential Layout Techniques. | 621.3815 SAV Electronic Design: Circuits And Systems | 621.3815 SCH Surviving the ASIC experience / |
Includes bibliographical references and index.