IC Mask Design: Essential Layout Techniques.

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Material type: Text

TextSeries: McGraw-Hill professional engineeringPublication details: New York : Mcgraw-Hill, c2002.Description: xviii, 457 p. : ill. (some col.) ; 24 cmISBN:

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Holdings
Item type	Current library	Home library	Collection	Shelving location	Call number	Status	Date due	Barcode	Item holds
Open Collection	FIRST CITY UNIVERSITY COLLEGE	FIRST CITY UNIVERSITY COLLEGE	Open Collection	FCUC Library	621.3815 SAI 2002 (Browse shelf(Opens below))	Available		00016580
Open Collection	FIRST CITY UNIVERSITY COLLEGE	FIRST CITY UNIVERSITY COLLEGE	Open Collection	FCUC Library	621.3815 SAI 2002 (Browse shelf(Opens below))	Available		00014172

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Includes bibliographical references and index.