MARC details
000 -LEADER |
fixed length control field |
01985nam a2200325 a 4500 |
001 - CONTROL NUMBER |
control field |
vtls000005629 |
003 - CONTROL NUMBER IDENTIFIER |
control field |
MY-PjKIC |
005 - DATE AND TIME OF LATEST TRANSACTION |
control field |
20250212112859.0 |
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION |
fixed length control field |
100211t1997 000 0 eng d |
020 ## - INTERNATIONAL STANDARD BOOK NUMBER |
International Standard Book Number |
9780471127925 |
035 ## - SYSTEM CONTROL NUMBER |
System control number |
0471127922 |
039 #9 - LEVEL OF BIBLIOGRAPHIC CONTROL AND CODING DETAIL [OBSOLETE] |
Level of rules in bibliographic description |
201006201022 |
Level of effort used to assign nonsubject heading access points |
faridah7 |
Level of effort used to assign subject headings |
201002111746 |
Level of effort used to assign classification |
VLOAD |
Level of effort used to assign subject headings |
201002111619 |
Level of effort used to assign classification |
VLOAD |
040 ## - CATALOGING SOURCE |
Transcribing agency |
fcuc |
050 ## - LIBRARY OF CONGRESS CALL NUMBER |
Classification number |
TK7871.85.84453 1997 |
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER |
Classification number |
621.38152 SEM 1997 |
090 ## - LOCALLY ASSIGNED LC-TYPE CALL NUMBER (OCLC); LOCAL CALL NUMBER (RLIN) |
Classification number (OCLC) (R) ; Classification number, CALL (RLIN) (NR) |
621.38152 SEM 1997 |
245 00 - TITLE STATEMENT |
Title |
Semiconductor Technology: Processing and Novel Fabrication Techniques. |
260 ## - PUBLICATION, DISTRIBUTION, ETC. |
Place of publication, distribution, etc. |
New York : |
Name of publisher, distributor, etc. |
John Wiley & Sons, |
Date of publication, distribution, etc. |
1997. |
300 ## - PHYSICAL DESCRIPTION |
Extent |
240 p. : |
Other physical details |
ill. |
500 ## - GENERAL NOTE |
General note |
"A Wiley-Interscience publication." |
500 ## - GENERAL NOTE |
General note |
Includes index. |
520 ## - SUMMARY, ETC. |
Summary, etc. |
Drawing on decades of Russian semiconductor research, this remarkable book makes available a great many Si and III-V semiconductor technologies that are practically unknown in the West. Often simpler and cheaper than conventional Western methods, these approaches will enable researchers to improve the quality of semiconductor materials and fabricate new types of devices. After a general introduction to semiconductor technology, the book describes transmutation doping, which offers all the advantages of neutron doping, permits controlled doping depth from 0.1 micron to 1mm, and offers the option of forming deep channels. Also presented is a novel technique using polymer spinon diffusant films for a uniform and reproducible introduction of impurities into silicon. Researchers and graduate students in solid state physics, device physics, materials science, and electrical engineering will find a wealth of original, stimulating, and valuable information in this unique manual. |
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM |
Topical term or geographic name entry element |
Semiconductors. |
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM |
Topical term or geographic name entry element |
Semiconductor doping. |
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM |
Topical term or geographic name entry element |
Semiconductors |
General subdivision |
Defects. |
700 1# - ADDED ENTRY--PERSONAL NAME |
Personal name |
Levinshtein, M. E. |
Fuller form of name |
(Mikhail Efimovich) |
700 1# - ADDED ENTRY--PERSONAL NAME |
Personal name |
Shur, Michael. |
942 ## - ADDED ENTRY ELEMENTS (KOHA) |
Source of classification or shelving scheme |
Dewey Decimal Classification |
Koha item type |
Open Collection |