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006 m o d
007 cr |||||||||||
008 100820s2011 nyua ob 001 0 eng
010 _a 2020688404
040 _aDLC
_beng
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019 _a726745731
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020 _a9781611221237
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020 _a1611221234
020 _z9781617618376
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020 _z1617618373
029 1 _aAU@
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029 1 _aDEBBG
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029 1 _aDEBBG
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029 1 _aDEBSZ
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035 _a(OCoLC)1162225843
_z(OCoLC)726745731
_z(OCoLC)923657261
_z(OCoLC)961602926
_z(OCoLC)962706360
_z(OCoLC)988521739
_z(OCoLC)991965015
_z(OCoLC)1037915305
_z(OCoLC)1038696795
_z(OCoLC)1045526243
_z(OCoLC)1066605485
_z(OCoLC)1081287759
_z(OCoLC)1153453550
050 0 0 _aTK7872.M3
072 7 _aTEC
_x008010
_2bisacsh
082 0 0 _a621.3815/31
_222
049 _aMAIN
245 0 0 _aLithography :
_bprinciples, processes and materials /
_cTheodore C. Hennessy, editor.
264 1 _aNew York :
_bNova Science,
_cc2011.
300 _a1 online resource.
336 _atext
_btxt
_2rdacontent
337 _acomputer
_bc
_2rdamedia
338 _aonline resource
_bcr
_2rdacarrier
490 1 _aEngineering tools, techniques and tables
490 1 _aNanotechnology science and technology
500 _aIncludes bibliographical references and index.
588 _aDescription based on print version record.
504 _a""REFERENCES""""LITHOGRAPHY: PRINCIPLES,PROCESSES AND MATERIALS""; ""ABSTRACT""; ""1. INTRODUCTION""; ""2. PRINCIPLE OF LITHOGRAPHY""; ""3. PROCESSES OF LITHOGRAPHY""; ""3.1. RIE-NSL Lithography [32]""; ""3.2. FIB Lithography""; ""3.3. Laser Interference Lithography""; ""4. MATERIALS OF LITHOGRAPHY""; ""4.1. Materials of RIE-NSL Lithography""; ""4.2. Materials of FIB Lithography""; ""4.3. Materials of Laser Interference Lithography""; ""5. CONCLUSIONS""; ""REFERENCES""; ""LASER INTERFERENCE LITHOGRAPHY""; ""ABSTRACT""; ""1. INTRODUCTION""; ""2. THEORY""; ""3. INSTRUMENTATION""
504 _aIncludes bibliographical references and index.
505 0 _a""LITHOGRAPHY:PRINCIPLES, PROCESSES AND MATERIALS""; ""CONTENTS""; ""PREFACE""; ""PRINCIPLE, PROCESSES AND MATERIALS FOR NANO IMPRINT LITHOGRAPHY""; ""1. INTRODUCTION""; ""2. PRINCIPLE AND FUNDAMENTAL PROCESS FOR NIL""; ""2.1. Principle of NIL""; ""2.2. Theoretical Analysis for NIL""; ""2.3. Fundamental Process for NIL""; ""3. VARIATIONS OF NIL PROCESSES""; ""3.1. Combined Thermal and UV-NIL""; ""3.2. Reverse Imprint Process""; ""3.3. Laser-Assisted Direct Imprint""; ""3.4. Roll Imprint Process""; ""3.5. Substrate Conformal Imprint Lithography (SCIL)""; ""3.6. Large Area Imprint""
505 8 _a""3.7. Nanoelectrode Lithography""""3.8. Hybrid NIL Process""; ""3.9. Metal Nanoparticle Nanoimprinting Process""; ""3.10. High Resolution NIL""; ""3.11. Other NIL Processes""; ""4. NIL MATERIALS""; ""4.1. NIL Resists""; ""4.2. Functional Materials and Other Imprintable Materials""; ""4.3. Mold Materials""; ""5. PROSPECTS AND CHALLENGES IN NIL""; ""6. CONCLUSION""; ""ACKNOWLEDGMENTS""; ""REFERENCES""; ""NANOFABRICATION IN ELECTRONBEAM LITHOGRAPHY""; ""1. ELECTRON BEAM LITHOGRAPHY OVERVIEW""; ""1.1. Introduction to the Electron Beam Lithography System""; ""1.2. Proximity Effect""
505 8 _a""1.3. Numerical Calculation of the E-beam (Monte Carlo Method)""""2. CARBON NANOTUBE (CNT) BASED DEVICES""; ""2.1.Introduction to carbon nanotubes ""; ""2.2. VACNT Based FE Device with Individual Cathode Structures""; ""2.3. Field Emission Properties of Single Vertically Aligned Carbon Nanotubes""; ""2. VARIO""; ""2.4. Application in Micro CNT Column System""; ""3. FABRICATION OF 3D NANOSTRUCTURES ON CYLINDRICAL ROLLERS""; ""3.1. Introduction to Nanolithography""; ""3.2. In-House Field Emission Measurement Facility""; ""4. CONCLUSIONS""; ""ACKNOWLEDGMENT""; ""REFERENCES""
505 8 _a""GENERATION OF MICRO PATTERNS ONSIDE SURFACES OF POLYMER AND SISUBSTRATES USING A MICROPUNCHING LITHOGRAPHY APPROACH""""ABSTRACT""; ""1. INTRODUCTION""; ""2. MACROPUNCHING METHOD AND MPL""; ""3. AU SIDEWALL PATTERNS ON HDPE CHANNELS""; ""3.1. Fabrication Procedure""; ""3.2. Experimental Results and Discussions""; ""4. SUPER HYDROPHOBIC PDMS CHANNELS""; ""4.1. Fabrication Process""; ""4.2. Experimental Results and Discussions""; ""5. FABRICATION OF AU DOTS ON SI SIDEWALLS""; ""5.1. Fabrication Procedures""; ""5.2. Results and Discussions""; ""6. SUMMARY AND CONCLUSIONS""; ""ACKNOWLEDGMENTS""
546 _aEnglish.
590 _aeBooks on EBSCOhost
_bEBSCO eBook Subscription Academic Collection - Worldwide
650 0 _aMicrolithography.
_0http://id.loc.gov/authorities/subjects/sh85084858
650 0 _aMicrofabrication.
_0http://id.loc.gov/authorities/subjects/sh96011316
650 7 _aTECHNOLOGY & ENGINEERING
_xElectronics
_xCircuits
_xGeneral.
_2bisacsh
650 7 _aMicrofabrication.
_2fast
_0(OCoLC)fst01019807
650 7 _aMicrolithography.
_2fast
_0(OCoLC)fst01019883
655 4 _aElectronic books.
700 1 _aHennessy, Theodore C.
776 0 8 _iPrint version:
_tLithography
_dNew York : Nova Science, c2011.
_z9781617618376 (hardcover)
_w(DLC) 2010033078
830 0 _aEngineering tools, techniques and tables.
_0http://id.loc.gov/authorities/names/no2011012899
830 0 _aNanotechnology science and technology series.
_0http://id.loc.gov/authorities/names/no2009109464
856 4 0 _uhttps://libproxy.firstcity.edu.my:8443/login?url=http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=367184
938 _aProQuest Ebook Central
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938 _aEBSCOhost
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